电浆化学气相沉积、溅镀与蚀刻-Plasma-CVD–Sputtering-and-Etching—Principles-and-Technology

Plasma SchematioA partially ionized gascreated by application of anelectric field.Positiveneutralsion/electron pairs areglow(radicals,unreacted gas)Sheathcreated by ionizationdischargeions(dark space)reactions,maintainingoverall charge neutral.electronsSubstrateCommonly,radio-frequency(rf)at 13.56 MHz is used tocreate the glow discharge.charged particlesare accelerated byTypical pressures arethe electric fieldbetween 1 mtorr and 5 torr.